PREVIEW

... the performance of the current mainstream lithography machines. However, it has achieved a minimum NA (numerical aperture) of 1.36.

Based on the feedback, with just a few adjustments, the production process for the 3NM limit can be completed.

Although it's still a bit behind ASML's latest two-nanometer limit process, it has essentially caught up to the mainstream, and the gap from the international top level has been narrowed to a tolerable extent.

And if we were to make ...

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